Impurity introducing apparatus having feedback mechanism using optical characteristics of impurity introducing region
AssigneePanasonic Corporation
InventorsCheng-Guo Jin, Yuichiro Sasaki, Bunji Mizuno
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Abstract
An impurity doping system is disclosed, which includes an impurity doping device for doping an impurity into a surface of a solid state base body, a measuring device for measuring an optical characteristic of an area into which the impurity is doped, and an annealing device for annealing the area into which the impurity is doped. The impurity doping system realizes an impurity doping not to bring about a rise of a substrate temperature, and measures optically physical properties of a lattice defect generated by the impurity doping step to control such that subsequent steps are optimized.
Claims10
An impurity doping system, comprising:
- an impurity doping means for doping an impurity into a surface of a solid state base body;
- a measuring means for measuring an optical characteristic of an area into which the impurity is doped to determine a wavelength effective for annealing the area into which the impurity is doped;
- a filter for passing only the annealing effective wavelength determined by the measuring means based on the measured optical characteristic of the area into which the impurity is doped;
- and
- an annealing means for annealing the area into which the impurity is doped.
Dependencies are inferred from the claim text.