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US 8,138,520 B2Granted
Bi-directional diode structure
AssigneeSemiconductor Components Industries, LLC
InventorsMark Duskin, Suem Ping Loo, Ali Salih
Life of this patent
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Abstract
In one embodiment, a bi-directional diode structure is formed to have a substantially symmetrical current-voltage characteristic.
Claims9
A bi-directional diode structure comprising:
- a substrate of a first conductivity type having a surface;
- a first diode that includes a first doped region of a second conductivity type formed on the surface of the substrate, the first doped region having an edge that is distal from the surface of the substrate;
- a second diode that includes a second doped region of the first conductivity type formed on the surface of the substrate and within the first doped region wherein the second doped region has a periphery;
- and
- a third doped region of the first conductivity type formed on the surface of the substrate and within the first doped region, the third doped region having a side spaced a first distance from a portion of the periphery of the second doped region and having a bottom edge of the third doped region positioned no greater than about twenty five microns from the edge of the first doped region wherein a current-voltage characteristic curve of the bi-directional diode structure is substantially symmetrical for a current flow in both directions through the bi-directional diode structure without a snap-back wherein the current increases but a voltage drop across the bi-directional diode structure decreases.
2 more elements
Dependencies are inferred from the claim text.