Formation of carbon and semiconductor nanomaterials using molecular assemblies
AssigneeInternational Business Machines Corporation
InventorsAli Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar
Life of this patent
Estimating the term…
Loading patent…
AssigneeInternational Business Machines Corporation
InventorsAli Afzali-Ardakani, Cherie R. Kagan, Laura L. Kosbar
Estimating the term…
The invention is directed to a method of forming carbon nanomaterials or semiconductor nanomaterials. The method comprises providing a substrate and attaching a molecular precursor to the substrate. The molecular precursor includes a surface binding group for attachment to the substrate and a binding group for attachment of metal-containing species. The metal-containing species is selected from a metal cation, metal compound, or metal or metal-oxide nanoparticle to form a metallized molecular precursor. The metallized molecular precursor is then subjected to a heat treatment to provide a catalytic site from which the carbon nanomaterials or semiconductor nanomaterials form. The heating of the metallized molecular precursor is conducted under conditions suitable for chemical vapor deposition of the carbon nanomaterials or semiconductor nanomaterials.
A transistor comprising:
A transistor comprising:
An electronic device structure comprising:
Dependencies are inferred from the claim text.