Magnetic scanning system with improved efficiency

An ion implantation system comprising:

• an ion source that generates an ion beam along a beam path;
• a mass analysis component downstream of the ion source that performs mass analysis on the ion beam;
• a magnetic deflection system either upstream or downstream of the mass analysis component, wherein the magnetic deflection system comprises:
• a yoke assembly having an entrance end and an exit end through which the beam path extends, wherein the beam path in the yoke assembly is generally bounded by an inner surface of the yoke assembly;
• first and second pole pieces extending from the yoke assembly towards the beam path in the yoke assembly;
• first and second coils wrapped around the first and second pole pieces, respectively, wherein the first and second coils are coupled to a current source configured to pass a time-varying current through the first and second coils such that the first and second coils generate an oscillatory time-varying magnetic field in the beam path in the yoke assembly;
• and
• at least one magnetic flux compression element disposed within the inner perimeter of the yoke assembly and outside the beam path region.