Photobase generator and photocurable resin composition

The photobase generator comprising a compound having a nitrogen atom and a conjugated double bond, wherein the compound comprises at least either of compounds represented by the following general formulas (3) and (4);

• wherein R1 and R2 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aralkyl group, or an aryl group;
• R3, R4, R5, R6 and R7 each independently represent a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, a cyano group, a formyl group, an acyl group, a nitro group, a nitroso group, an alkyl group, an alkenyl group, a cycloalkyl group, an aralkyl group, an aryl group, a hydroxy group, a mercapto group, an alkylthioether group, an alkoxy group, a halogen group, or an amino group;
• R1, R2, R3, R4, R5, R6 and R7, at least two of which may bond together to form a saturated or an unsaturated ring, may each independently be substituted with a monovalent group formed by removing a hydrogen atom from the compound represented by the formula (3) or (4);
• and Z represents an oxygen atom or a sulfur atom;
• wherein R1 represents a hydrogen atom, an alkyl group, an alkenyl group, a cycloalkyl group, an aralkyl group, or an aryl group;
• R3, R4, R5, R6, R7 and R8 each independently represent a hydrogen atom, a carboxyl group, an alkoxycarbonyl group, a cyano group, a formyl group, an acyl group, a nitro group, a nitroso group, an alkyl group, an alkenyl group, a cycloalkyl group, an aralkyl group, an aryl group, a hydroxy group, a mercapto group, an alkylthioether group, an alkoxy group, a halogen atom, or an amino group;
• R′, R2, R3, R4, R5, R6, R7 and R8, at least two of which may bond together to form a saturated or an unsaturated ring, may each independently be substituted with a monovalent group formed by removing a hydrogen atom from the compound represented by the formula (3) or (4).