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US 8,137,875 B2Granted
Method and apparatus for overlay compensation between subsequently patterned layers on workpiece
AssigneeMicronic Mydata AB
InventorsFredrik Sjöström, Mikael Wahlsten
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Abstract
Methods and apparatuses for patterning workpieces are provided. The methods and apparatuses described herein improve overlay between subsequently patterned layers on a workpiece by introducing an improved alignment method that compensates for workpiece distortions.
Claims11
A method for patterning and aligning a workpiece, the method comprising:
- acquiring a first Z-shape of the workpiece;
- patterning a reference grid on the workpiece;
- acquiring a second Z-shape of the workpiece;
- calculating a set of compensation values based on the acquired first and second Z-shapes;
- updating the reference grid based on the calculated set of compensation values;
- and
- patterning a subsequent layer of the workpiece.
4 more elements
Dependencies are inferred from the claim text.