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US 8,137,870 B2Granted
Method of manufacturing photomask
AssigneeSamsung Electronics Co., Ltd.
InventorsMyoung-soo Lee, Young-su Sung, Hee-bom Kim, Min-kyung Lee, Dong-gun Lee
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Abstract
A method of manufacturing a photomask includes: providing a photomask; exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask using the aerial image; and altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation.
Claims19
A method of manufacturing a photomask, the method comprising:
- providing a photomask;
- exposing the photomask with light to obtain an aerial image of the photomask and evaluating the photomask based on the aerial image, wherein the light transmitted to the photomask is not transferred onto a wafer;
- obtaining a percentage dose (illumination intensity) drop value map if an absolute value of a difference between a design CD and a measured CD is not in an allowable range;
- and
- altering an optical parameter of the photomask associated with the aerial image based on the percentage dose (illumination intensity) drop value map.
2 more elements
A method of manufacturing a photomask, the method comprising:
- providing a photomask;
- exposing the photomask to obtain an aerial image of the photomask and evaluating the photomask based on the aerial image, wherein exposing the photomask to obtain the aerial image comprises using the same illumination system as an illumination system used to transfer a pattern of the photomask onto a wafer;
- and
- altering an optical parameter of the photomask associated with the aerial image according to the result of evaluation,
- wherein obtaining the aerial image comprises using zero-order light T0, −primary light T−1 and +primary light T+1 that reacts with the photomask.
2 more elements
Dependencies are inferred from the claim text.