Dual position DC magnetron assembly
AssigneeWD Media, LLC
InventorAllen Bourez
Life of this patent
Estimating the term…
Abstract
A sputtering system includes a first sputtering assembly configured to sputter material onto a first disk and a second sputtering assembly configured to sputter material onto a second disk, the second sputtering assembly positioned proximate the first sputtering assembly. The first sputtering assembly includes a first magnetic ring, and the second sputtering assembly includes a second magnetic ring. The first magnetic ring includes a first region of lower relative magnetic strength positioned near the second magnetic ring, and the second magnetic ring includes a second region of lower relative magnetic strength positioned near the first magnetic ring.
Claims15
A sputtering system, comprising:
- a first sputtering assembly configured to sputter material onto a first disk, the first sputtering assembly including:
- a first anode;
- a first cathode;
- a first target electrically coupled to at least one of the first anode and the first cathode;
- and
- a first magnetic ring;
- and
- a second sputtering assembly configured to sputter material onto a second disk, the second sputtering assembly positioned proximate to the first sputtering assembly and including:
- a second anode;
- a second cathode;
- a second target electrically coupled to at least one of the second anode and the second cathode;
- and
- a second magnetic ring;
- wherein the first magnetic ring includes a first region of lower relative magnetic strength than other portions of the first magnetic ring, so that the first region of the first magnetic ring is positioned near the second magnetic ring, and the second magnetic ring includes a second region of lower relative magnetic strength than other portions of the second magnetic ring, so that the second region of the second magnetic ring is positioned near the first magnetic ring.
Dependencies are inferred from the claim text.