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US 8,137,496 B2Granted
Method of fabricating wire grid polarizer
AssigneeSamsung Electronics Co., Ltd.
InventorsSu-mi Lee, Chang-ho Noh
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Abstract
Provided is a method of fabricating a wire grid polarizer. The method includes: forming a photocatalytic layer on a first substrate; forming a patterned resin layer having a plurality of parallel grooves; forming a wire grid by filling the grooves with a metal; and transferring the wire grid and the resin layer to a second substrate.
Claims28
A method of fabricating a wire grid polarizer, the method comprising:
- forming a photocatalytic layer by coating a photocatalytic compound on a first substrate;
- forming a resin layer having a plurality of parallel grooves, on the photocatalytic layer, each of the grooves being spaced apart from the other;
- activating the photocatalytic layer;
- filling the grooves of the resin layer with a metal to provide a grid of metal wires formed in the resin layer;
- providing a second substrate having an inner surface on which an adhesive layer is coated,
- bonding the second substrate by using the adhesive layer to top surfaces of the resin layer and the grid of metal wires;
- and
- separating the resin layer and the grid of metal wires from the photocatalytic layer and thus transferring the resin layer and the grid of metal wires to the second substrate.
5 more elements
Dependencies are inferred from the claim text.