Polishing pad having micro-grooves on the pad surface
AssigneeInnopad, Inc.
InventorsOscar K. Hsu, Marc C. Jin, David Adam Wells, John Erik Aldeborgh
Life of this patent
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Abstract
A polishing pad is provided herein, which may include a plurality of soluble fibers having a diameter in the range of about 5 to 80 micrometers, and an insoluble component. The pad may also pad include a first surface having a plurality of micro-grooves, wherein the soluble fibers form the micro-grooves in the pad. The micro-grooves may have a width and/or depth up to about 150 micrometers. In addition, a method of forming the polishing pad and a method of polishing a surface with the polishing pad is disclosed.
Claims18
A polishing pad for use with polishing slurry comprising:
- a nonwoven fabric including a plurality of soluble fibers having a diameter in the range of 5 to 80 micrometers, wherein said soluble fibers comprise one or more of nonwoven fibrous and fabric structures, woven and knitted fibrous and fabric structures, and
- an insoluble component,
- wherein said pad has a thickness and includes a first surface having a plurality of interconnected self-generating micro-grooves, wherein said soluble fibers are positioned through at least a portion of the thickness of the pad to continuously dissolve and form said micro-grooves in a newly exposed surface of said pad by exposure to said slurry, said micro-grooves having a width and/or depth in the range up to 150 micrometers, and
- wherein said micro-grooves are arranged in an array of longitudinal indentations in said first surface of said pad and retain and distribute said polishing slurry and said self-generating microgrooves are arranged in one of a crisscross, circular, spiral, radial, or centripetal arrays.
A polishing pad for use with polishing slurry comprising:
- a nonwoven fabric including a plurality of soluble fibers having a diameter in the range of 5 to 80 micrometers, wherein said soluble fibers comprise one or more of nonwoven fibrous and fabric structures, woven and knitted fibrous and fabric structures, and
- an insoluble component comprising an insoluble fiber,
- wherein said pad has a thickness and includes a first surface having a plurality of interconnected micro-grooves, wherein said soluble fibers are positioned through at least a portion of the thickness of the pad to continuously dissolve and form said micro-grooves in a newly exposed surface of said pad by exposure to said slurry, said micro-grooves having a width and/or depth in the range up to 150 micrometers wherein said micro-grooves are arranged in an array of longitudinal indentations in said first surface of said pad and retain and distribute said polishing slurry and said self-generating microgrooves are arranged in one of a crisscross, circular, spiral, radial, or centripetal arrays.
A polishing pad which provides a relatively high surface density of microgrooves upon exposure to aqueous media comprising:
- a nonwoven fabric including a plurality of soluble fibers having a diameter in the range of 5 to 80 micrometers, wherein said soluble fibers comprise one or more of nonwoven fibrous and fabric structures, woven and knitted fibrous and fabric structures, and
- an insoluble component,
- wherein said pad has a thickness and includes a first surface having a plurality of interconnected self-generating micro-grooves, wherein said soluble fibers are positioned through at least a portion of the thickness of the pad to dissolve and form said micro-grooves in a newly exposed surface of said pad by exposure to said aqueous media, said micro-grooves having a width and/or depth in the range up to 150 micrometers, and
- wherein said micro-grooves are arranged in an array of longitudinal indentations in said first surface of said pad to retain and distribute a polishing slurry and said self-generating microgrooves are arranged in one of a crisscross, circular, spiral, radial, or centripetal arrays.
Dependencies are inferred from the claim text.