Device and a method for applying an even, thin fluid layer to substrates

Abstract

A device for applying an even, thin fluid layer, in particular a phosphoric acid layer, onto substrates, in particular silicon cells for photovoltaic application, is provided with a process chamber, which is provided with a fluid pan and a high-frequency ultrasound device that converts the fluid into fluid mist, and with a transport device that is arranged beneath a fluid-mist dropping shaft of the process chamber for the substrates. To create a device of this type, which permits an application of the fluid onto the silicon cells in question that is substantially more homogeneous regarding both surface area and volume, the fluid-mist dropping shaft of the process chamber tapers in its interior cross-section towards the transport device and discharges into a passage shaft arrangement for the substrates that covers the transport device, and the interior cross-section of the orifice end of the fluid-mist dropping shaft and of the passage shaft arrangement are coordinated with each other, preferably being essentially identical.

Dependencies are inferred from the claim text.