Method for manufacturing a magnetic write head

A method for manufacturing a magnetic write head, comprising:

• providing a substrate;
• depositing a magnetic write pole material over the substrate;
• forming a mask structure over the magnetic write pole material, the mask structure including a hard mask layer formed on the magnetic write pole material, a marker layer formed on the hard mask layer and a RIEable image transfer layer formed on the marker layer;
• performing a first ion milling to remove portions of the write pole material that are not protected by the mask structure, thereby forming a write pole structure having first and second sides;
• depositing a non-magnetic material over the remaining mask structure and write pole;
• and
• performing second ion milling sufficiently to expose the remaining mask and until the marker layer has been detected;
• wherein the second ion milling is performed sufficiently to form a recess in the substrate, the method further comprising forming a magnetic trailing wrap-around shield that extends into the recess in the substrate.

A method for manufacturing a magnetic write head, comprising:

• providing a substrate;
• depositing a magnetic write pole material over the substrate;
• forming a mask structure over the magnetic write pole material, the mask structure including a hard mask layer formed on the magnetic write pole material, a marker layer formed on the hard mask layer and a RIEable image transfer layer formed on the marker layer;
• performing a first ion milling to remove portions of the write pole material that are not protected by the mask structure, thereby forming a write pole structure having first and second sides;
• depositing a non-magnetic material over the remaining mask structure and write pole;
• and
• performing second ion milling sufficiently to expose the remaining mask and until the marker layer has been detected;
• wherein the second ion milling is performed sufficiently to form a recess in the substrate.

A method for manufacturing a magnetic write head, comprising:

• providing a substrate;
• depositing a magnetic write pole material over the substrate;
• forming a mask structure over the magnetic write pole material, the mask structure including a hard mask layer formed on the magnetic write pole material, a marker layer formed on the hard mask layer and a RIEable image transfer layer formed on the marker layer;
• performing a first ion milling to remove portions of the write pole material that are not protected by the mask structure, thereby forming a write pole structure having first and second sides;
• depositing a non-magnetic material over the remaining mask structure and write pole;
• and
• performing second ion milling sufficiently to expose the remaining mask and until the marker layer has been detected;
• wherein the second ion milling is performed sufficiently to form a recess in the substrate, the method further comprising forming a magnetic trailing wrap-around shield that extends into the recess in the substrate.