Standard cell placement
AssigneeArm Limited
InventorMarlin Wayne Frederick
Life of this patent
Estimating the term…
Abstract
A method of generating a layout of an integrated circuit is provided, the method comprising the steps of: providing functional data representing circuit elements and connections between the circuit elements, providing a cell library defining a plurality of standard cells, each standard cell representing a potential component for forming the integrated circuit, providing compatibility information indicative of the compatibility of the boundaries of the standard cells, and generating a placement of standard cells in dependence on the functional data and the compatibility information to produce the layout such that no abutting cells have incompatible boundaries.
Claims18
A method of generating a layout of an integrated circuit using a computer, said integrated circuit comprised of a plurality of circuit elements and connections between circuit elements, said circuit elements comprising a variety of standard cells in abutting relationships, each of said variety of standard cells having boundaries, said method comprising the steps of:
- providing the computer with functional data representing said circuit elements and said connections between said circuit elements of said integrated circuit;
- providing the computer with a cell library defining said plurality of standard cells, each standard cell representing a potential component for forming said integrated circuit;
- providing the computer with compatibility information indicative of compatibility of boundaries of each of said variety of standard cells;
- and
- generating on the computer a placement of standard cells in dependence on said functional data and said compatibility information so as to produce said layout such that no abutting cells have incompatible boundaries, wherein said incompatible boundaries result from positions of elements of respective standard cells relative to their respective standard cell boundaries, wherein said incompatible boundaries arise from dopant implantation extending beyond a standard cell boundary, wherein said incompatible boundaries arise from a first standard cell having a first dopant implantation extending beyond a first standard cell boundary and a second standard cell having a second dopant implantation extending beyond a second standard cell boundary, and said first dopant implantation and second implantation have different dopant characteristics.
A method of generating a layout of an integrated circuit using a computer, said integrated circuit comprised of a plurality of circuit elements and connections between circuit elements, said circuit elements comprising a variety of standard cells in abutting relationships, each of said variety of standard cells having boundaries, said method comprising the steps of:
- providing the computer with functional data representing said circuit elements and said connections between said circuit elements of said integrated circuit;
- providing the computer with a cell library defining said plurality of standard cells, each standard cell representing a potential component for forming said integrated circuit;
- providing the computer with compatibility information indicative of compatibility of boundaries of each of said variety of standard cells;
- and
- generating on the computer a placement of standard cells in dependence on said functional data and said compatibility information so as to produce said layout such that no abutting cells have incompatible boundaries, wherein said incompatible boundaries result from positions of elements of respective standard cells relative to their respective standard cell boundaries, wherein said plurality of standard cells comprises at least one type of filler cell, wherein said at least one type of filler cell comprises a first dopant implanted area and a second dopant implanted area, said first dopant implanted area and said second dopant implanted area having different dopant characteristics.
Dependencies are inferred from the claim text.