Method and system for incorporation of patterns and design rule checking
AssigneeCadence Design Systems, Inc.
InventorsLouis K. Scheffer, David C. Noice
Life of this patent
Estimating the term…
Loading patent…
AssigneeCadence Design Systems, Inc.
InventorsLouis K. Scheffer, David C. Noice
Estimating the term…
Methods and systems for representing the limitations of a lithographic process using a pattern library instead of, or in addition to, using design rules. The pattern library includes “known good” patterns, which chip fabricators know from experience are successful, and “known bad” patterns, which chip fabricators know to be unsuccessful. The pattern library can be used to contain exceptions to specified design rules, or to replace the design rules completely. In some implementations, the pattern library contains statistical information that is used to contribute to an overall figure of merit for the design. In other implementations, a routing tool may generate a plurality of possible IC layouts, and select one IC layout based on information contained in the pattern library.
A computer-implemented method for analyzing suitability of an Integrated Circuit (IC) layout for manufacture, comprising:
A computer-implemented method for designing a physical layout for an Integrated Circuit (IC), comprising:
A system for analyzing suitability of an Integrated Circuit (IC) layout for manufacture, comprising:
A computer program module comprising a non-transitory computer-usable medium storing a computer program comprising instructions which, when executed by a processor, cause the processor to perform a process for analyzing suitability of an Integrated Circuit (IC) layout for manufacture, the process comprising:
A system for designing a physical layout for an Integrated Circuit (IC), comprising:
A computer program module comprising a non-transitory computer-usable medium storing a computer program comprising instructions which, when executed by a processor, cause the processor to perform a method, the method comprising:
Dependencies are inferred from the claim text.