Optical pulse generating apparatus using photoelectric effect of surface plasmon resonance photons and its manufacturing method
AssigneeStanley Electric Co., Ltd.
InventorTakahiro Matsumoto
Life of this patent
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Abstract
In an optical pulse generating apparatus including a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light as an optical pulse signal, a dielectric layer formed on an opposite surface of the metal layer opposing the incident/reflective surface, and a dielectric layer exciting unit for exciting the dielectric layer on a time basis, the incident light exciting surface plasmon resonance light in the metal layer while the dielectric layer is excited on a time basis, so that an extinction coefficient of the dielectric layer is made negative.
Claims23
An optical pulse generating apparatus, comprising:
- a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light as an optical pulse signal;
- a dielectric layer formed on an opposite surface of said metal layer opposing said incident/reflective surface;
- and
- a dielectric layer exciting unit adapted to excite said dielectric layer on a time basis,
- said incident light exciting surface plasmon resonance light in said metal layer while said dielectric layer is excited on a time basis so that an extinction coefficient of said dielectric layer is made negative.
A method for manufacturing an optical pulse generating apparatus, comprising:
- a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light as an optical pulse signal;
- a dielectric layer deposited on an opposite surface of said metal layer opposing said incident/reflective surface;
- and
- a dielectric layer exciting unit adapted to excite said dielectric layer on a time basis,
- said incident light exciting surface plasmon resonance light in said metal layer while said dielectric layer is excited on a time basis so that an extinction coefficient of said dielectric layer is made negative,
- said method comprising:
- determining a thickness of said metal layer, so that the reflectivity of said incident light at said incident/reflective surface of said metal layer is minimum a total reflection region when said incident light is incident to said incident/reflective surface of said metal layer while said dielectric layer is not excited;
- determining at least one candidate of an incident angle of said incident light to said metal layer and a thickness of said dielectric layer, so that the reflectivity of said incident light at said incident/reflective surface of said metal layer is minimum in said total reflection region while said determined thickness of said metal layer is maintained and said dielectric layer is not excited;
- and
- determining a thickness of said dielectric layer corresponding to an excited state of said dielectric layer, so that the reflectivity of said incident light at said incident angle of said candidate is beyond a predetermined value while said thickness of said dielectric layer of said candidate is maintained.
A method for manufacturing an optical pulse generating apparatus, comprising:
- a metal layer having an incident/reflective surface adapted to receive incident light and output its reflective light as an optical pulse signal;
- a dielectric layer deposited on an opposite surface of said metal layer opposing said incident/reflective surface;
- a resonator layer deposited on an opposite surface of said dielectric layer opposing said metal layer;
- and
- a dielectric layer exciting unit adapted to excite said dielectric layer on a time basis,
- said incident light exciting surface plasmon resonance light in said metal layer while said dielectric layer is excited on a time basis so that an extinction coefficient of said dielectric layer is made negative,
- said method comprising:
- determining a thickness of said resonator layer in accordance with a predetermined transmittivity of said resonator layer;
- determining a thickness of said dielectric layer;
- determining an incident angle of said incident light at said incident/reflective surface of said metal layer and a thickness of said metal layer, so that the reflectivity of said incident light at said incident/reflective surface of said metal layer is minimum in a total reflection region when said incident light is incident to said incident/reflective surface of said metal layer while said dielectric layer is not excited;
- and
- determining a thickness of said dielectric layer corresponding to an excited state of said dielectric layer, so that the reflectivity of said incident light at said incident angle is beyond a predetermined value while said incident angle of said incident light at said incident/reflective surface of said metal layer and said thickness of said dielectric layer are maintained.
Dependencies are inferred from the claim text.