Writer and reader arrangements for shingled writing

A method of forming a read/write head structure to reduce skew between a reader and written tracks in shingled writing, comprising:

• (a) providing a substrate with a first (S1) shield having a top surface formed thereon;
• (b) performing a shallow angle ion beam etch to form a sloped center section in said top surface;
• (c) forming a gap layer on the top surface of the S1 shield and a reader within the gap layer such that said reader is aligned parallel to the sloped center section of the S1 shield;
• (d) forming a S2 shield with a bottom surface that contacts a top surface of the gap layer, said bottom surface has a sloped center section parallel to the sloped center section of the S1 shield and said reader is positioned between the sloped center sections of the S1 and S2 shields;
• (e) forming an insulation layer on a top surface of the S2 shield;
• and
• (f) forming a write head on the insulation layer wherein said write head includes a write pole with a trailing edge, a write gap that is aligned parallel to said substrate, and a shield structure that includes at least a trailing shield and a side shield, said side shield has a first side aligned with a first side of the S1 and S2 shields and a second side aligned with a second side of the S1 and S2 shields.

A PMR write head for shingled writing, comprising:

• (a) a write pole having a leading edge formed parallel to a substrate along the ABS, two sides that form an angle β with respect to a first plane that is perpendicular to the substrate, and a trailing edge that intersects the two sides at two corners, said trailing edge has a greater width along the ABS than the leading edge;
• forms an angle α at each corner with respect to a second plane that is parallel to the leading edge and includes the two corners, and is bowed towards the leading edge such that a center point on the trailing edge has a smaller pole height than the corners;
• (b) a first side gap formed adjacent to a first write pole side, a second side gap formed adjacent to a second write pole side, and a write gap formed adjacent to the trailing edge;
• and
• (c) a shield structure including a trailing shield that is separated from the trailing edge by the write gap, a right side shield which is connected to the trailing shield proximate to the first write pole side and separated from the first write pole side by a first side gap, and a left side shield which is connected to the trailing shield proximate to the second write pole side and separated from the second write pole side by the second side gap.

A PMR write head for shingled writing, comprising:

• (a) an asymmetrical write pole having a leading edge formed parallel to a substrate along the ABS, a first side that has a greater length at the ABS than a second side and that forms an angle β′ with respect to a first plane that is perpendicular to the substrate, and a straight trailing edge that intersects the first side at a write corner and the second side at a second corner, said trailing edge has a greater width along the ABS than the leading edge and forms an angle α′ at the write corner with respect to a second plane that is parallel to the leading edge, said write corner has a larger pole height than said second corner;
• (b) a first side gap formed adjacent to the first write pole side, and a write gap formed adjacent to the trailing edge;
• and
• (c) a shield structure including a trailing shield that is separated from the trailing edge by the write gap, and a first side shield which is connected to the trailing shield proximate to the first write pole side and separated from the first write pole side by the first side gap.

A method of forming a PMR write head for shingled writing, comprising:

• (a) forming a write pole on a substrate and within a non-magnetic layer, said write pole has a leading edge contacting the substrate, a trailing edge formed parallel to the substrate and having a width greater than a width of the leading edge, and two sides of equal length connecting the leading edge with the trailing edge at a first corner where the first side intersects the trailing edge and at a second corner where the second side intersects the trailing edge, said first side and second side each form an angle β with respect to a plane that is perpendicular to the substrate;
• (b) forming a photoresist mask on a portion of the non-magnetic layer proximate to the first side;
• and
• (c) performing an ion beam etch (IBE) process to form a sloped and straight trailing edge that has a write corner at the intersection of the trailing edge with the first side, and has an angle α′ with respect to a plane that is parallel to the substrate and intersects the write corner, said write corner has a greater pole height than a corner of the sloped trailing edge on the second side.