Method for producing ink-jet head

Abstract

There is provided a method for producing an ink jet head. The method includes: first oxidizing in which, in an SOI substrate having a first SiO2 layer between a first Si layer and a second Si layer, among the first Si layer and the second Si layer, at least the first Si layer is thermally oxidized to form a second SiO2 layer; forming a nozzle hole by removing a part of the second SiO2 layer and a part of the first Si layer between the first SiO2 layer and the second SiO2 layer, by performing an etching treatment until at least the first SiO2 layer is exposed; second oxidizing in which a side wall of at least the first Si layer in the formed nozzle hole is thermally oxidized to form an SiO2 layer; opening the nozzle hole by subjecting the SiO2 layers in the nozzle hole other than at the side wall to an anisotropic dry etching treatment until at least the second Si layer is exposed; and forming a nozzle by removing the second Si layer.

Dependencies are inferred from the claim text.