Method for preparing an oriented-porosity dielectric material on a substrate by means of electromagnetic and/or photonic treatment
AssigneeCommissariat a l'Energie Atomique
InventorAziz Zenasni
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Abstract
Provided a method for producing an oriented-porosity dielectric material on a substrate. The method includes depositing a vapor phase on a substrate of a composite layer comprising a material forming a matrix and a compound comprising chemical groups capable of being oriented under the effect of an electromagnetic field and/or photonic radiation; treating the composite layer to obtain the cross-linking of the material forming a matrix; and subjecting the substrate coated with the composite layer to an electromagnetic field and/or a photonic radiation.
Claims13
A method for producing an oriented-porosity dielectric material on a substrate, the method comprising:
- a) depositing a composite layer on a substrate by a vapor phase deposition, the composite layer comprising a material forming a matrix and a compound comprising at least one chemical group capable of being oriented under the effect of an electric voltage;
- b) treating the composite layer to cross-link the material thereby forming a matrix;
- said method further comprising c) subjecting said substrate coated with said composite layer to an electric voltage, wherein the subjecting c) is carried out simultaneously with the treating b), wherein the electric voltage is applied in contact with the substrate, wherein said subjecting c) is carried out so as to align the chemical groups in the deposited composite layer in a predetermined direction.
Dependencies are inferred from the claim text.