US 8,133,428 B2Granted

Photocurable composition, process for producing fine patterned product and optical element

AssigneeAsahi Glass Company, Limited

InventorsYuriko Kaida, Hiroshi Sakamoto, Hirotsugu Yamamoto

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Abstract

To provide a photocurable composition with which a fine pattern molded product on which a fine pattern of a mold is highly precisely transferred can efficiently be produced. A photocurable composition comprising 100 parts by mass of a photocurable monomer (A), from 5 to 60 parts by mass of a colloidal silica (B) (solid content) having an average particle size of at most 200 nm, and from 0.1 to 10 parts by mass of a photopolymerization initiator (C), wherein the photocurable monomer (A) comprises a multifunctional monomer (A1) having at least 3(meth)acryloyloxy groups in one molecule and a bifunctional monomer (A2) having two (meth)acryloyloxy groups in one molecule, at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%.

Claims9

Dependent claims

A fine pattern molded product, comprising a cured product obtained by photocuring a photocurable composition on a fine pattern of a mold having the fine pattern on its surface;

wherein:
prior to the photocuring, the viscosity of the photocurable composition containing substantially no solvent at 50° C. is from 1 to 200 mPa/s;
the fine pattern comprises a pattern of recesses and protrusions repeatedly formed on the surface of the product;
and
the pattern of recess and protrusions is characterized by an average distance between adjacent protrusions in the range of 10 nm to 10 μm, an average protrusion width in the range of 10 nm to 5 μm, and an average protrusion height in the range of 10 nm to 10 μm;
and
wherein the photocurable composition comprises a photocurable monomer (A), a colloidal silica (B) having an average particle size of at most 200 nm and a photopolymerization initiator (C) in contents of the colloidal silica (B) (solid content) of from 5 to 60 parts by mass and the photopolymerization initiator (C) of from 0.1 to 10 parts by mass per 100 parts by mass of the photocurable monomer (A), wherein the photocurable monomer (A) comprises at least the following multifunctional monomer (A1) and the following bifunctional monomer (A2);
and at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of the hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%:
multifunctional monomer (A1):
a compound having at least 3(meth)acryloyloxy groups in one molecule;
bifunctional monomer (A2):
a compound having two (meth)acryloyloxy groups in one molecule.

9 more elements

A process for producing a fine pattern molded product, which comprises sandwiching and pressing a photocurable composition between a fine pattern surface of a mold having the fine pattern on its surface and a substrate (step A), curing the photocurable composition by irradiation with light to form a fine pattern molded product comprising a cured product having a surface on which the fine pattern of the mold is transferred (step B), and separating at least one of the mold and the substrate from the cured product to obtain a fine pattern molded product, a fine pattern molded product integrated with the substrate, or a fine pattern molded product integrated with the mold (step C);

and
wherein the photocurable composition comprises a photocurable monomer (A), a colloidal silica (B) having an average particle size of at most 200 nm and a photopolymerization initiator (C) in contents of the colloidal silica (B) (solid content) of from 5 to 60 parts by mass and the photopolymerization initiator (C) of from 0.1 to 10 parts by mass per 100 parts by mass of the photocurable monomer (A), wherein the photocurable monomer (A) comprises at least the following multifunctional monomer (A1) and the following bifunctional monomer (A2);
and at least one compound belonging to the multifunctional monomer (A1) or the bifunctional monomer (A2) has a hydroxy group, and the ratio of the total amount (mol) of the hydroxy groups to the total amount (mol) of the multifunctional monomer (A1) and the bifunctional monomer (A2) is at least 10%:
multifunctional monomer (A1):
a compound having at least 3(meth)acryloyloxy groups in one molecule;
bifunctional monomer (A2):
a compound having two (meth)acryloyloxy groups in one molecule.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 12/659,934Filed 25 Mar 2010 · continuation
Priority: JP 2007-25541628 Sep 2007
Published: US 2010/0259821 A114 Oct 2010
Granted: 13 Mar 2012
Term ends: Not estimatedThe source records don’t support an estimate.

Classification13 codes

C08F 2/44
Processes of polymerisation: polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
C08F 2/48
Polymerisation initiated by wave energy or particle radiation: by ultraviolet or visible light
C08F 290/06
On to polymers modified by introduction of unsaturated end groups: polymers provided for in subclass C08G
C08F 292/00
Macromolecular compounds obtained by polymerising monomers on to inorganic materials