Pattern transfer method and imprint device
AssigneeHitachi, Ltd.
InventorsTakashi Ando, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
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AssigneeHitachi, Ltd.
InventorsTakashi Ando, Susumu Komoriya, Masahiko Ogino, Akihiro Miyauchi
Estimating the term…
In order to allow for aligning a relative position between a transferred object and a stamper with high accuracy without providing an alignment pattern in the transferred object, there are provided: a pattern transfer method, including: when adjusting the relative position between the stamper and the transferred object, a step of detecting at least two or more edge positions of the transferred object and calculating an arbitrary point from the detected edge positions; a step of detecting a position of the stamper from an edge of the stamper or an alignment mark formed in the stamper; and a step of adjusting the relative position between the transferred object and the stamper from the arbitrary point and the position of the stamper; and an imprint device using the same.
A pattern transfer method, comprising:
Dependencies are inferred from the claim text.