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US 8,133,364 B2Granted
Formation of photoconductive and photovoltaic films
AssigneeAdvanced Integration, Inc.
InventorGeorge Engle
Life of this patent
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Abstract
The present application discloses a method and system of depositing a lead selenide film onto another material. The lead selenide film may used in a photoconductive application or a photovoltaic application. Furthermore, the applications may be responsive to infrared radiation at ambient temperature. In one embodiment, a method includes sputtering the lead selenide film, performing a sensitization process, and applying a passivation film. In one exemplary embodiment, a p-n junction is formed by directly adhering a lead selenide film to a silicon substrate.
Claims11
A process of forming a photovoltaic film, the process comprising:
- sputtering a lead selenide film directly on a substrate, wherein the material of the substrate has a coefficient of thermal expansion different than lead selenide material;
- sensitizing the substrate;
- and
- applying, to the lead selenide film, a passivation film configured to seal the lead selenide film from contaminants.
1 more element
Dependencies are inferred from the claim text.