Vacuum plasma generator
AssigneeHUETTINGER Elektronik GmbH + Co. KG
InventorsMichael Glück, Christoph Hofstetter, Gerd Hintz
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Abstract
Workpieces in a vacuum chamber are treated by receiving a mains voltage from a voltage supply network; generating at least one intermediate circuit voltage; generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage; generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage; and coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.
Claims10
A method of treating workpieces in a vacuum chamber, the method comprising:
- receiving a mains voltage from a voltage supply network;
- rectifying the mains voltage to generate at least one intermediate circuit voltage;
- generating a first RF signal of a basic frequency, and of a first phase position, from the at least one intermediate circuit voltage;
- generating a second RF signal of the basic frequency, and of a second phase position, from the at least one intermediate circuit voltage;
- and
- coupling the first and the second signal and generating an output signal for the vacuum chamber using a 3 dB coupler.
Dependencies are inferred from the claim text.