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US 8,132,793 B2Granted
Method and apparatus for liquid precursor atomization
AssigneeMSP Corporation
InventorBenjamin Y. H. Liu
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AssigneeMSP Corporation
InventorBenjamin Y. H. Liu
Estimating the term…
An apparatus for atomizing a precursor liquid for vapor generation and thin film deposition on a substrate. The precursor liquid is atomized by a carrier gas to form a droplet aerosol composed of small precursor liquid droplets suspended in the carrier gas. The droplet aerosol is then heated to form vapor, producing a gas/vapor mixture that can be introduced into a deposition chamber to form thin films on a substrate. The liquid is introduced into the atomizing apparatus in such a manner as to avoid excessive heating that can occur or lead to the formation of undesirable by-products due to material degradation as result of thermal decomposition. The apparatus is particularly suited for vaporizing high molecular weight substances with a low vapor pressure that requires a high vaporization temperature for the liquid to vaporize. The apparatus can also be used to vaporize solid precursors dissolved in a solvent for vaporization.
An apparatus for atomizing a precursor liquid in a gas to form a droplet aerosol comprised of droplets suspended in the gas for vaporization and formation of a gas/vapor mixture for subsequent thin film deposition on a substrate, said apparatus comprising:
A method for decreasing heat transfer in an atomizer, the atomizer having a vaporization unit to which is delivered a precursor chemical in a carrier gas by way of a tubular housing, the atomizer producing a droplet aerosol for subsequent use in thin film deposition on a substrate, the method comprising:
Dependencies are inferred from the claim text.