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US 8,114,267 B2Granted
Method of monitoring a substrate patterning process
AssigneeAcreo AB
InventorsStaffan Nordlinder, Nathaniel D. Robinson, Payman Therani
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Abstract
A method for monitoring a substrate patterning process, where at least two electrodes are used to apply a voltage to the substrate to cause a reaction in a portion of the substrate, that includes recording a current driven by said voltage as a function of time and/or as a function of a position of the substrate or a patterning mask. Also disclosed are a device and a computer program product for monitoring the substrate patterning process.
Claims10
A method for monitoring a substrate patterning process, the method comprising:
- providing a substrate that includes an electrically conducting polymer;
- bringing an electrolyte into contact with the substrate;
- using at least two electrodes to apply a voltage to the substrate to cause an electronically driven electrochemical reduction or an oxidation reaction in an interface between the electrolyte and the substrate
- recording a current driven by said voltage as a function of time and/or as a function of a position of the substrate or a patterning mask during the patterning process.
1 more element
A method for monitoring a substrate patterning process, the method comprising:
- providing a substrate that includes an electrically conducting polymer;
- bringing an electrolyte into contact with the substrate;
- using at least two electrodes to apply a voltage to the substrate to provide a predetermined current causing an electronically driven electrochemical reduction or an oxidation reaction in an interface between the electrolyte and a portion of the substrate;
- and
- recording the voltage as a function of time and/or as a function of a position of the substrate or a patterning mask during the patterning process.
2 more elements
Dependencies are inferred from the claim text.