Inspection apparatus and inspection method
AssigneeHitachi High-Technologies Corporation
InventorsKazuo Takahashi, Takahiro Jingu
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AssigneeHitachi High-Technologies Corporation
InventorsKazuo Takahashi, Takahiro Jingu
Estimating the term…
Reflected light caused by the state of the surface of a wafer, a foreign material or a defect is superimposed on a haze frequency component caused by the type and thickness of a film or a surface irregularity. It has therefore been difficult to accurately measure the haze frequency component by use of a fixed threshold value. In order to detect a haze frequency component caused by a haze present on the surface of an object to be inspected, light propagating from the object to be inspected is detected and converted into an electric signal. The electric signal is sampled at a predetermined sampling time interval and converted into digital data. A frequency component caused by a foreign material, a defect or the like is separated from the digital data to ensure that a haze frequency component is selected. The haze frequency component is caused by a stain attached to the surface of the wafer, hazy tarnish, a surface irregularity or the like.
An inspection apparatus comprising:
An inspection method which illuminates with light an object that is to be inspected and placed on a movable stage to inspect a region present on the surface of the object or inspect the inside of the object that is located near the surface of the object, comprising the steps of:
Dependencies are inferred from the claim text.