One-dimensional arrays of block copolymer cylinders and applications thereof
AssigneeMicron Technology, Inc.
InventorsDan B. Millward, Karl Stuen
Life of this patent
Estimating the term…
Abstract
Methods for fabricating sublithographic, nanoscale microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Claims48
A method of forming a nanostructured polymer material on a substrate, comprising:
- forming a self-assembling block copolymer material within a single trench or a plurality of trenches having ends not aligned, said trench(es) in a material layer on the substrate, the trench(es) having a neutral wetting floor, and opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer;
- and
- annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material in a one-dimensional (1-D) array of a single row for the length of the trench(es).
A method of forming a polymer layer on a substrate, comprising:
- depositing a cylindrical-phase block copolymer material in a trench in a material layer on the substrate to a thickness of about the L value of the block copolymer or greater in the trench, the trench having sidewalls, ends and a floor that are preferential wetting to a first block of the block copolymer;
- and
- solvent annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material in a one-dimensional (1-D) array of a single row for the length of the trench.
A method of forming a polymer layer on a substrate, comprising:
- depositing a cylindrical-phase block copolymer material in a trench in a material layer on the substrate to a thickness of about the L value of the block copolymer in the trench, the trench having sidewalls, ends and a floor that are preferential wetting to a first block of the block copolymer;
- and
- thermal annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer.
A method of etching a substrate, comprising:
- annealing a block copolymer material situated in a single trench or a plurality of trenches having ends not aligned, said trench(es) in a material layer overlying the substrate, the trench having opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer, a floor, a width and a length, wherein the block copolymer material forms a one-dimensional (1-D) array of a single row of perpendicular-oriented cylinders of the minority polymer block in a matrix of a majority polymer block, said annealed block copolymer material having a thickness, and the cylinders extending through said thickness of the annealed block copolymer;
- selectively removing one of the polymer blocks to form openings exposing the substrate;
- and
- etching exposed portions of the substrate to form openings therein.
A method of etching a substrate, comprising:
- forming a block copolymer material within a single trench or a plurality of trenches having ends not aligned, said trench(es) in a material layer overlying the substrate, the trench or trenches having opposing sidewalls and ends that are preferentially wetting to a minority polymer block of the block copolymer, a floor, a width and a length;
- causing a microphase separation in the block copolymer material to form cylindrical domains composed of a first polymer block in a matrix of a second polymer block within the trench(es), the cylindrical polymer domains oriented perpendicular to the trench floor and registered to the sidewalls in a one-dimensional (1-D) array of a single row extending the length of the trench(es);
- optionally, selectively crosslinking the polymer matrix;
- selectively removing the cylindrical polymer domains to form openings through the polymer matrix;
- and
- etching the substrate through the openings in the polymer matrix.
A method of forming a nanostructured polymer material on a substrate, comprising:
- forming a self-assembling block copolymer material within a trench in a material layer on the substrate, the trench having a neutral wetting floor, opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer;
- and
- annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material;
- wherein the cylindrical polymer domains are in two rows for the length of the trench, with adjacent cylindrical domains offset from each other in a zig-zag arrangement at a center-to-center distance of about one-half the L value of the block copolymer in a direction parallel to the trench sidewalls.
A polymeric material situated within a single trench or a plurality of trenches having ends not aligned, said trench(es) in a material layer overlying a substrate, the trench(es) having sidewalls, ends, a floor, a width and a length, the polymeric material comprising a self-assembled block copolymer material comprising cylindrical polymer domains of a minority polymer block in a matrix of a majority polymer block, the cylindrical polymer domains oriented perpendicular to the trench floor and in a one-dimensional (1-D) array of a single row extending the length of the trench(es).
A polymeric material situated within a trench in a material layer overlying a substrate, the trench having sidewalls, ends, a floor, a width and a length, the polymeric material comprising a self-assembled block copolymer material comprising cylindrical polymer domains of a minority polymer block in a matrix of a majority polymer block;
- wherein the cylindrical polymer domains are oriented perpendicular to the trench floor and in two rows for the length of the trench, with adjacent cylindrical domains offset from each other in a zig-zag arrangement at a center-to-center distance of about one-half the L value of the block copolymer in a direction parallel to the trench sidewalls.
A method of forming a polymer material on a substrate, comprising:
- depositing a self-assembling block copolymer material in a plurality of trenches in a material layer on the substrate, the trenches having a width, a length, and a floor and opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer;
- and
- annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material in a one-dimensional (1-D) array of a single row for the length of the trenches.
A method of forming a polymer material on a substrate, comprising:
- depositing a self-assembling block copolymer material in a plurality of trenches in a material layer on the substrate, the trenches having a floor, a width, a length, and opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer, the ends of the trenches not aligned with each other;
- and
- annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material in a one-dimensional (1-D) array of a single row for the length of the trenches.
A polymeric material situated within a plurality of trenches in a material layer overlying a substrate, the trench having sidewalls, ends, a floor, a width and a length, the ends of the trenches not aligned with each other, the polymeric material comprising a self-assembled block copolymer material comprising cylindrical polymer domains of a minority polymer block in a matrix of a majority polymer block, the cylindrical polymer domains oriented perpendicular to the trench floor and in a one-dimensional (1-D) array of a single row extending the length of the trenches.
A method of forming a polymer material on a substrate, comprising:
- depositing a self-assembling block copolymer material in a single trench in a material layer on the substrate, the trench having a floor, a width, a length, and opposing sidewalls and ends that are preferentially wetting to a minority block of the block copolymer;
- and
- annealing the block copolymer material such that said block copolymer material self-assembles into cylindrical domains of the first block of the block copolymer within a matrix of a second block of the block copolymer, said self-assembled block copolymer material having a thickness, and the cylindrical polymer domains oriented perpendicular to the trench floor and extending through said thickness of the self-assembled block copolymer material in a one-dimensional (1-D) array of a single row for the length of the trench.
Dependencies are inferred from the claim text.