Methods to fabricate a photoactive substrate suitable for shaped glass structures

A method to fabricate a shaped glass structure, comprising:

• preparing a photosensitive glass substrate having a composition comprising:
• less than 76 weight % silica, at least 0.15 weight % Ag2O, at least 0.75 weight % B2O3, at least 11 weight % Li2O, and at least 0.0014 weight % CeO2;
• exposing at least one portion of the photosensitive glass substrate with an activating energy source, such as ultraviolet light (300 to 320 nm) or a directed source of protons using an activation exposure of 0.1-15 J/cm2, while leaving at least a second portion of said glass substrate unexposed;
• heating the glass substrate for at least ten minutes at a temperature that is in a temperature range of 420-520° C., heating the glass substrate for at least ten minutes at a temperature that is in a temperature range of 520-620° C., and cooling the glass substrate thereby transforming at least part of the exposed glass substrate to a crystalline material;
• and
• etching the glass substrate in an HF-containing etchant solution, wherein an etch ratio of exposed portion to said unexposed portion is at least 40:1, to provide a shaped glass structure.