Integrated circuit with gate electrode level region including multiple linear-shaped conductive structures forming gate electrodes of transistors and including uniformity extending portions of different size

An integrated circuit, comprising:

• a gate electrode level region including at least two linear-shaped conductive structures formed to extend lengthwise in a first direction, the at least two linear-shaped conductive structures including,
• a first linear-shaped conductive structure including a portion that forms a gate electrode of a first transistor of a first transistor type, the first linear-shaped conductive structure also including a first extending portion that extends away from a first end of the gate electrode of the first transistor of the first transistor type by a first extension length as measured in the first direction, and
• a second linear-shaped conductive structure including a portion that forms a gate electrode of a second transistor of the first transistor type, the second linear-shaped conductive structure including a first extending portion that extends away from a first end of the gate electrode of the second transistor of the first transistor type by a second extension length as measured in the first direction,
• wherein the first extension length is different than the second extension length, and
• wherein the first extension length is larger than a size of the gate electrode of the first transistor of the first transistor type as measured in the first direction.