Bottom antireflective coating compositions
AssigneeAZ Electronic Materials USA Corp.
InventorsFrancis M. Houlihan, Shinji Miyazaki, Mark O. Neisser, Alberto D. Dioses, Joseph E. Oberlander
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Abstract
Developable bottom antireflective coating compositions are provided.
Claims16
An actinic radiation absorbing positive bottom photoimageable antireflective coating composition which is capable of being developed with an aqueous alkali developer and which is capable of being coated below a positive photoresist, wherein the antireflective coating composition comprises a polymer, a thermal acid generator, and a photoacid generator, where the photoacid generator is insoluble in a solvent of the photoresist, further where the photoacid generator is selected from a group consisting of
- (i) a photoacid generator where the cation is a monovalent cation with a volume of less than or equal to about 450 cubic angstroms, the anion is a divalent anion with a volume of less than or equal to about 205 cubic angstroms, and the photoacid generator has a melting point of at least 80° C.;
- (ii) a photoacid generator where the cation is a monovalent cation with a volume of less than or equal to about 450 cubic angstroms, the anion is a trivalent anion with a volume of less than or equal to about 220 cubic angstroms, and the photoacid generator has a melting point of at least 80° C.;
- (iii) a photoacid generator where the cation is a divalent cation with a volume of less than or equal to about 450 cubic angstroms, the anion is a monovalent anion with a volume of less than or equal to about 165 cubic angstroms, and the photoacid generator has a melting point of at least 130° C., and
- (iv) mixtures thereof.
Dependencies are inferred from the claim text.