Self-segregating multilayer imaging stack with built-in antireflective properties

A method of forming a patterned material layer on a substrate, said method comprising:

• (a) providing a substrate;
• (b) forming a layer of a self-segregating polymeric composition on said substrate, where said self-segregating polymeric composition comprises;
• i. a polymeric photoresistive material comprising a positive working photoresist or a negative working photoresist,
• ii. a polymeric BARC material,
• iii. an optional radiation-sensitive acid generator and,
• iv. an optional base quencher,
• to form a coated substrate comprising a uniaxial bilayer polymer coating on and substantially parallel to said substrate, said uniaxial bilayer polymer coating undergoing a phase separation that is oriented in a direction orthogonal to said substrate, said coated substrate thereby including a top photoresistive coating layer and a bottom antireflective coating layer;
• (c) optionally, forming a layer comprising a top coat material on said uniaxial bilayer;
• (d) pattern-wise exposing said coated substrate to imaging radiation to form a patterned area comprising exposed areas and unexposed areas, and optionally an area not covered by a pattern;
• (e) optionally, baking the exposed substrate;
• and
• (f) contacting said coated substrate with a developer;
• wherein said antireflective coating comprises a silicon polymer having the general structure:
• where (SiO1.5) comprises a polysilsesquioxane polymer backbone, R1 and R2 independently comprise a linear, branched, or cyclic alkylene group of 1 to about 10 carbons, A is either hydrogen, methoxy-, ethoxy or other alkoxy-, halogen or an ester group, B is hydroxy-, carboxy or a carboxamido-group and is independently located in the 2-, 3- or 4-positions of the benzene ring, C is a nonaromatic moiety comprising:
• where D and E independently are hydrogen, hydroxy-, acetoxy-groups, alkylalkoxy- or alkylacetoxy-groups or D and E can form a cyclic epoxide, the molar fractions x, y and z independently represent a value from 0 to about 0.8 and the sum of x, y and z equals 1 or
• wherein said antireflective coating comprises an amide polymer having a general structure:
• where R3 is a linear, branched, or cyclic alkylene group of 1 to about 10 carbons, G is hydrogen, hydroxy-, acetoxy-, methoxy-, ethoxy- or other alkoxy-, halogen, ester, carboxy- or a carboxamido-group, J is alkyl, alkoxy-, or up to about 6 carbon atom carboalkoxy or alkoxycarbonyl esters, lactone or anhydride moieties, the molar fractions x, y and z independently are from 0 to about 0.5 and the sum of x, y and z equals 1, and the amide group is an organic amidic group:
• where R can be methyl, ethyl, phenyl or vinyl and R′ and R″ can be independently hydrogen, alkyl, or an aryl group.