Process for producing nano-device using potential singular points on substrate

A process for producing a nano-device comprising:

• a step for intentionally forming a pattern of a plurality of potential singular points on a substrate having a surface roughness of 1 nm or less;
• wherein the potential singular points are recess points on the substrate formed by using one or more of the group consisting of an electron beam, a convergent atomic beam, a convergent ion beam, or nanolithography, and said pattern is formed by controlling the interval and position at which each of the recess points are provided;
• a contacting step for contacting and bonding first compounds with the potential singular points, each of the first compounds having one or more functional groups;
• and
• a step for bonding the first compounds with second compounds after the first compounds bond with the substrate via the potential singular points, each of the second compounds being capable of bonding at least one of the first compounds, wherein the first compounds are different from the second compounds and a plurality of first compounds are bonded to a single second compound,
• wherein the first compounds and the second compounds constitutes the nano-device,
• wherein the one or more functional groups interacts with the potential singular points, and
• wherein the step for forming potential singular points controls the positions of the potential singular points so that the space positions of the first compounds are controlled
• wherein each of said first compounds having one or more functional groups is a porphyrin compound denoted by the following General Formula (I):
• wherein M is one selected from the group consisting of two hydrogen atoms, a divalent metal, a trivalent metal derivative, or a tetravalent metal derivative;
• R′ is one selected from the group consisting of an alkenyl group of 2 to 12 carbon atoms, an alkenyloxy group of 2 to 12 carbon atoms, a dienyl group of 3 to 6 carbon atoms, an alkynyl group of 2 to 12 carbon atoms, an alkynyloxy group of 2 to 12 carbon atoms, a hydroxyl group, an alkoxy group of 1 to 12 carbon atoms, an acyl group of 1 to 12 carbon atoms, an acyloxy group of 1 to 30 carbon atoms, a carboxyl group, an alkoxycarbonyl group of 1 to 12 carbon atoms, a carbamoyl group, an alkylcarbamoyl group of 1 to 12 carbon atoms, an amino group, an alkylamino group of 1 to 12 carbon atoms, an arylamino group, a cyano group, an isocyano group, an acylamino group of 1 to 12 carbon atoms, a nitroso group, a nitro group, a mercapto group, an alkylthio group of 1 to 12 carbon atoms, a sulfo group, a sulfino group, an alkylsulfonyl group of 1 to 12 carbon atoms, a thiocyanato group, an isothiocyanato group, a thiocarbonyl group, a sulfamoyl group, an alkylsulfamoyl group of 1 to 12 carbon atoms, a hydroxyiminomethyl group (—CH═NOH), an alkoxyiminomethyl group, an alkenyloxyiminomethyl group of 1 to 12 carbon atoms, an alkynyloxyiminomethyl group of 1 to 12 carbon atoms, an alkyliminomethyl of 1 to 12 carbon atoms, an alkylsulfamoyliminomethyl group of 1 to 12 carbon atoms, a thiocarboxyl group, a hydroxyaminocarbonyl group, an alkoxyaminocarbonyl group, and halogens;
• X is one selected from the group consisting of an alkyl group of 1 to 12 carbon atoms, an alkoxy group of 1 to 12 carbon atoms, a trialkylsilyloxy group, a phenyldialkylsilyloxy group, and an alkyldiphenylsilyloxy group;
• Y is one selected from the group consisting of a hydrogen atom, a hydroxyl group, an alkoxy group of 1 to 30 carbon atoms, an alkenyloxy group of 2 to 30 carbon atoms, an alkynyloxy group of 2 to 30 carbon atoms, and an acyloxy group of 1 to 30 carbon atoms;
• and R5 to R8 are each independently one of the group consisting of a hydrogen atom, a halogen atom, an amino group, a hydroxyl group, a nitro group, a cyano group, and alkyl groups of 1 to 3 carbon atoms that may have a substituent group.