Pattern inspection apparatus and method
AssigneeNuFlare Technology, Inc.
InventorsTakayuki Abe, Hideo Tsuchiya
Life of this patent
Estimating the term…
Abstract
A pattern inspection apparatus includes a stage configured to mount a target workpiece to be inspected thereon, a sensor configured to include a plurality of light receiving elements arrayed in a second direction orthogonal to a first direction which moves relatively to the stage, and to capture optical images of the target workpiece by using the plurality of light receiving elements, an accumulation unit configured to accumulate each pixel data of the optical images overlappingly captured by the sensor at positions shifted each other in the second direction by a pixel unit, for each pixel, and a comparison unit configured to compare the each pixel data accumulated for each pixel with predetermined reference data.
Claims10
A pattern inspection apparatus comprising:
- a stage configured to mount a target workpiece to be inspected thereon;
- a sensor configured to include a plurality of light receiving elements arrayed in a second direction orthogonal to a first direction which moves relatively to the stage, and to capture optical images of the target workpiece by using the plurality of light receiving elements;
- an accumulation unit configured to accumulate each pixel data of the optical images overlappingly captured by the sensor at positions shifted each other in the second direction by a pixel unit, for each pixel;
- and
- a comparison unit configured to compare the each pixel data accumulated for each pixel with predetermined reference data.
A pattern inspection apparatus comprising:
- a stage configured to mount a target workpiece to be inspected thereon;
- a plurality of sensors configured to respectively include a plurality of light receiving elements arrayed in a second direction orthogonal to a first direction which moves relatively to the stage, to be arranged at positions shifted each other in the second direction by a pixel unit of a number of elements fewer than a number of the plurality of light receiving elements, and to respectively capture an optical image of the target workpiece by using the plurality of light receiving elements;
- an accumulation unit configured to accumulate each pixel data of optical images captured by the plurality of sensors, for each pixel;
- and
- a comparison unit configured to compare the each pixel data accumulated for each pixel with predetermined reference data.
A pattern inspection method comprising:
- capturing optical images of a target workpiece to be inspected overlappingly by a sensor including a plurality of light receiving elements arrayed in a direction orthogonal to an inspection direction, at positions shifted each other by a pixel unit;
- accumulating each pixel data of the optical images overlappingly captured, for each pixel;
- and
- comparing the each pixel data accumulated for each pixel with predetermined reference data, and outputting a comparing result.
A pattern inspection method comprising:
- arranging a plurality of sensors each including a plurality of light receiving elements arrayed in a direction orthogonal to an inspection direction, at positions shifted each other in the direction by a pixel unit of a number of elements fewer than a number of the plurality of light receiving elements, and capturing optical images of a target workpiece to be inspected, by using the plurality of sensors;
- accumulating each pixel data of the optical images captured by the plurality of sensors, for each pixel;
- and
- comparing the each pixel data accumulated for each pixel with predetermined reference data, and outputting a comparing result.
Dependencies are inferred from the claim text.