Pattern generating apparatus and pattern shape evaluating apparatus

A pattern generating apparatus that generates a reference pattern used to evaluate a shape of a circuit pattern of an electronic device, the pattern generating apparatus comprising:

• a contour distribution data generating means for generating contour distribution data of at least two circuit patterns from contour data sets of the at least two circuit patterns;
• a reference pattern generating means for generating, from the contour distribution data, a reference pattern used in a pattern test;
• and
• a means for performing pattern matching between design data and each of the contour data sets to determine a position for overlaying the contour data set on the design data,
• wherein the contour distribution data generating means generates the contour distribution data based on the position for overlaying the contour data set on the design data.

A pattern generating apparatus that generates a reference pattern used to evaluate a shape of a circuit pattern of an electronic device, the pattern generating apparatus comprising:

• a contour distribution data generating means for generating contour distribution data of at least two circuit patterns from contour data sets of the at least two circuit patterns;
• and
• a reference pattern generating means for generating, from the contour distribution data, a reference pattern used in a pattern test,
• wherein the contour distribution data generating means compares a shape of each of the contour data sets with a default value of the shape of the circuit pattern, and generates the contour distribution data only by using the contour data sets satisfying the default value of the shape of the circuit pattern.

A pattern generating apparatus that generates a reference pattern used to evaluate a shape of a circuit pattern of an electronic device, the pattern generating apparatus comprising:

• a contour distribution data generating means for generating contour distribution data of at least two circuit patterns from contour data sets of the at least two circuit patterns;
• and
• a reference pattern generating means for generating, from the contour distribution data, a reference pattern used in a pattern test,
• wherein the reference pattern generating means figures out a distribution of contours from the contour distribution data, and sets the reference pattern within a range of the distribution of contours.