Methods for altering one or more parameters of a measurement system
AssigneeLuminex Corporation
InventorsEdward Calvin, Wayne D. Roth
Life of this patent
Estimating the term…
Abstract
Methods for altering one or more parameters of a measurement system are provided. One method includes analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample. The method also includes identifying a region in a classification space in which the values for the populations are located. In addition, the method includes determining an optimized classification region for the population using one or more properties of the region. The optimized classification region contains a predetermined percentage of the values for the population. The optimized classification region is used for classification of particles in additional samples.
Claims14
A method for altering one or more parameters of a measurement system, comprising:
- analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample;
- identifying a region in a classification space in which the values for the population are located;
- and
- determining an optimized classification region for the population using one or more properties of the values of the population, wherein the optimized classification region contains a predetermined and fixed percentage of the values for the population, wherein the optimized classification region is used for classification of particles in additional samples, and wherein the one or more properties of the values of the population comprise an average, mean, peak, or median of the values of the population and a standard deviation of the values of the population.
Dependencies are inferred from the claim text.