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US 8,077,289 B2Granted
Device and method for influencing the polarization distribution in an optical system
AssigneeCarl Zeiss SMT GmbH
InventorDamian Fiolka
Life of this patent
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Abstract
The disclosure relates to a device and a method for influencing the polarization distribution in an optical system, in particular in a microlithographic projection exposure apparatus. A device according to the disclosure includes a plurality of polarization-influencing optical elements which are arranged in a common plane in such a way that they can be moved independently of each other.
Claims30
A device, comprising:
- a plurality of optical elements arranged in a common plane and movable independently of each other,
- wherein:
- each of the optical elements is capable of converting a state of polarization of incoming light on the optical element into another state of polarization;
- the optical elements are movable independently of each other in respective directions that are radial relative to a common axis;
- and
- the device is configured to be capable of influencing a polarization distribution in a microlithographic projection exposure apparatus when the device is used in the microlithographic projection exposure apparatus.
3 more elements
A device, comprising:
- a plurality of optical elements arranged in a common plane and movable independently of each other,
- wherein:
- each of the optical elements is capable of converting a state of polarization of incoming light on the optical element into another state of polarization;
- at least one of the optical elements has a thickness that amounts to not more than 15% of their average width;
- and
- the device is configured to be capable of influencing a polarization distribution in a microlithographic projection exposure apparatus when the device is used in the microlithographic projection exposure apparatus.
3 more elements
An apparatus, comprising:
- a projection objective configured to project an image of an object field into an image field in an area, the area being movable in a first direction relative to the projection objective;
- a first device comprising a first plurality of optical elements arranged in a plane, the first plurality of optical elements being movable independently of each other;
- and
- a second device comprising a second plurality of optical elements arranged in the plane and movable independently of each other,
- wherein:
- for each of the optical elements of the first and second pluralities of optical elements, the optical element is capable of converting a state of polarization of incoming light on the optical element into another state of polarization;
- the plane extends perpendicular to a propagation direction of light incident on the optical elements during use of the apparatus, and
- the apparatus is a microlithographic projection exposure apparatus.
5 more elements
Dependencies are inferred from the claim text.