Electron beam processing device

An electron beam processing device comprising:

• a chamber housing defining a chamber interior space and having a first opening,
• a carriage movable along the first opening,
• an electron beam generator disposed on the carriage such that an electron beam generated thereby propagates through the first opening along an electron beam propagation axis, and
• a circular disk disposed between the chamber housing and the carriage, the disk being rotatable about a stationary rotational axis at least between a first rotational position and a second rotational position, wherein a second opening is defined in the disk and has an elongated shape that does not encompass the rotational axis of the disk, and wherein the first opening overlaps the second opening at least along the electron beam propagation axis at all rotational positions of the disk.

An electron beam processing device comprising:

• a chamber housing defining a chamber interior space and having a first opening,
• a carriage linearly movable relative to the chamber housing,
• an electron beam generator disposed on the carriage such that an electron beam generated thereby propagates through the first opening along an electron beam propagation axis, and
• a circular disk disposed between the chamber housing and the carriage, the disk being rotatable relative to the chamber housing and relative to the carriage about a stationary rotational axis at least between a first rotational position and a second rotational position, wherein a second opening having an elongated shape is defined in the disk and the first opening overlaps the second opening at least along the electron beam propagation axis at all rotational positions of the disk.

An electron beam processing device comprising:

• a chamber housing defining a chamber interior space and having a first opening, wherein the first opening is slot-shaped,
• a carriage movable along the first opening,
• an electron beam generator disposed on the carriage such that an electron beam generated thereby passes through the first opening when the carriage moves along the first opening, and
• a disk disposed between the chamber housing and the carriage, the disk being rotatable about a rotational axis, which is perpendicular to the first opening, at least between a first rotational position and a second rotational position, wherein a second opening is defined in the disk and extends radially spaced from the rotational axis of the disk and wherein the rotational axis of the disk is stationary relative to the chamber housing during rotation between the first and second rotational positions and is disposed such that the first opening overlaps the second opening at least along an electron beam propagation axis when the disk rotates between the first rotational position and the second rotational position.