Nanoparticle-based etching of silicon surfaces

A method of reducing reflectivity of a silicon surface, comprising:

• providing a silicon surface;
• positioning a plurality of nanoparticles of a catalytic material proximate to the silicon surface;
• soaking the silicon surface and the nanoparticles in a bath of oxidant-etchant solution;
• agitating the oxidant-etchant solution until the silicon surface is etched to have a texture that reduces reflectivity of the etched silicon surface;
• and
• removing the nanoparticles from the etched silicon surface with a stripping solution.

A method of texturing a silicon wafer, comprising:

• placing the silicon wafer in a container;
• providing a volume of solution including metal nanoparticles in the container;
• providing a volume of oxidant-etchant solution in the container, wherein the oxidant-etchant solution comprises an etching agent and an oxidizing agent;
• agitating the nanoparticle solution and the oxidant-etchant solution in the container until a surface of the silicon wafer becomes etched to have a reflectance of less than about 15 percent;
• and
• removing the metal nanoparticles from the etched surface of the silicon wafer.