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US 8,075,702 B2Granted
Resist removing method and resist removing apparatus
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorMasayuki Wada
Life of this patent
Estimating the term…
Abstract
In an inventive resist removing method, sulfuric acid and hydrogen peroxide water are supplied to a surface of a substrate to remove a resist from the substrate surface. Thereafter, hydrogen peroxide water is supplied to the substrate surface to remove the sulfuric acid from the substrate surface.
Claims10
A resist removing method comprising the steps of:
- (a) supplying sulfuric acid and hydrogen peroxide water to a surface of a substrate to remove a resist from the substrate surface;
- and
- (b) supplying hydrogen peroxide water to the substrate surface after step (a) to remove the sulfuric acid and the hydrogen peroxide water supplied at step (a) from the substrate surface, wherein
- at step (b), the sulfuric acid remaining at the surface of the substrate chemically reacts with the hydrogen peroxide water supplied at step (b) into Caro's acid, and the sulfuric acid and the hydrogen peroxide water remaining at the surface of the substrate are replaced with the hydrogen peroxide water supplied at step (b).
1 more element
A resist removing method comprising the steps of:
- supplying sulfuric acid and hydrogen peroxide water to a surface of a substrate to remove a resist from the substrate surface;
- and
- supplying hydrogen peroxide water to the substrate surface after the sulfuric acid/hydrogen peroxide water supplying step to remove the sulfuric acid and the hydrogen peroxide water supplied in the sulfuric acid/hydrogen peroxide water supplying step from the substrate surface, wherein
- sulfuric acid adhering to the surface of the substrate chemically reacts with the hydrogen peroxide water into Caro's acid in the hydrogen peroxide water supplying step.
1 more element
Dependencies are inferred from the claim text.