Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing
AssigneeTokyo Electron Limited
InventorsHiroshi Kannan, Tadahiro Ishizaka, Yasuhiko Kojima, Yasuhiro Oshima, Takashi Shigeoka
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Abstract
A substrate processing unit comprises a processing vessel for receiving a substrate, a cleaning gas supply system for supplying cleaning gas to the processing vessel so as to clean the interior of the processing vessel, an exhauster for exhausting the processing vessel, an operating state detector for detecting the operating state of the exhauster, and an end point detector for detecting the end point of the cleaning on the basis of the detection result from the operating state detector.
Claims19
A substrate processing unit comprising:
- a processing vessel that accommodates a substrate;
- a cleaning gas supply system that supplies a cleaning gas into the processing vessel to be used in performing a cleaning of an interior of the processing vessel;
- an exhauster that includes rotor blades that exhaust the interior of the processing vessel by rotation of the rotor blades;
- an operating state detector that detects effects of collisions between a gas and the rotor blades so as to determine a change in an amount of or a molecular weight of the gas that passes through the exhauster;
- and
- an end point detector that detects an end point of the cleaning based on a detection result from the operating state detector.
A substrate processing unit comprising:
- a processing vessel that accommodates a substrate;
- a process gas supply system that supplies a process gas into the processing vessel to be used in performing a processing on the substrate;
- an exhauster that includes rotor blades that exhaust an interior of the processing vessel by rotation of the rotor blades;
- an operating state detector that detects effects of collisions between a gas and the rotor blades so as to determine a change in an amount of or a molecular weight of the gas that passes through the exhauster;
- and
- an end point detector that detects an end point of the processing based on a detection result from the operating state detector.
A substrate processing unit comprising:
- a processing vessel that accommodates a substrate;
- a cleaning gas supply system that supplies a cleaning gas into the processing vessel to be used in performing a cleaning of an interior of the processing vessel;
- an exhauster that includes rotor blades that exhaust the interior of the processing vessel by rotation of the rotor blades;
- operating state detector means for detecting effects of collisions between a gas and the rotor blades so as to determine a change in an amount of or a molecular weight of the gas that passes through the exhauster;
- and
- means for detecting an end point of the cleaning based on a detection result from the operating state detector means.
A substrate processing unit comprising:
- a processing vessel that accommodates a substrate;
- a process gas supply system that supplies a process gas into the processing vessel to be used in performing a processing on the substrate;
- an exhauster that includes rotor blades that exhaust the interior of the processing vessel by rotation of the rotor blades;
- operating state detector means for detecting effects of collisions between a gas and the rotor blades so as to determine a change in an amount of or a molecular weight of the gas that passes through the exhauster;
- and
- means for detecting an end point of the processing based on a detection result from the operating state detector means.
Dependencies are inferred from the claim text.