Method of measuring a bevel angle in a write head
AssigneeWestern Digital (Fremont), LLC
InventorsAlexandre Anguelouch, Donghong Li
Life of this patent
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Abstract
A method of measuring a bevel angle in a write pole comprises the step of providing a mask over a wafer containing the write pole. The mask has a first opening over the write pole and a second opening over a sacrificial region of the wafer. The sacrificial region comprises a same material as the write pole. The method further comprises the steps of performing a beveling operation on the write pole and the sacrificial region to form a first bevel in the write pole and a second bevel in the sacrificial region, and measuring an angle of the second bevel in the sacrificial region to determine the bevel angle of the write pole.
Claims13
A method of measuring a bevel angle in a write pole, comprising the steps of:
- providing a mask over a wafer containing the write pole and a proxy structure, the mask having a first opening over the write pole and a second opening over the proxy structure of the wafer, the proxy structure comprising a same material as the write pole;
- performing a beveling operation on the write pole and the proxy structure to form a first bevel in the write pole and a second bevel in the proxy structure;
- and
- measuring an angle of the second bevel in the proxy structure to determine an angle of the first bevel of the write pole.
Dependencies are inferred from the claim text.