Device and method for patterning structures on a substrate
AssigneeInternational Business Machines Corporation
InventorsSiegfried F. Karg, Roland Germann, Heike E. Riel, Walter Heinrich Riess, Reto Schlittler
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Abstract
A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.
Claims7
A method for patterning structures on a substrate, comprising:
- providing a substrate underneath a tip of an Atomic Force Microscope;
- providing a vapour of a material, which is suitable for Chemical Vapour Deposition onto the substrate when decomposed, in a space between the tip and the substrate;
- and
- exposing the tip to a light beam emitted by a light emitting device in such a way that the tip intensifies an electromagnetic near-field created through a surface Plasmon resonance to such an extent that the vapour is decomposed, wherein an intensity of the light beam at the tip of the Atomic Force Microscope is not enough to decompose the vapour.
Dependencies are inferred from the claim text.