Image formation with prevention of tracing pattern from being noticeable on edges of stacked media
AssigneeKonica Minolta Business Technologies, Inc.
InventorDaisuke Genda
Life of this patent
Estimating the term…
Abstract
An image forming apparatus to carry out image forming on a recording medium by adding a specific pattern to image data inputted, having a mask creation section to create a mask area where addition of the specific pattern is prohibited and a control section to carry out image forming in a way that addition of the specific pattern is prohibited in the mask area.
Claims13
An image forming apparatus to form an image on a recording medium by adding a specific pattern, which is barely-noticeable, to image data inputted, comprising:
- a mask creation section to create a mask area in which addition of the specific pattern is prohibited so as to prevent the specific pattern from becoming noticeable at side edges of the recording media when the recording media are stacked;
- a control section to carry out image forming in a way that addition of the specific pattern is prohibited in the mask area;
- and
- an input section to which post-processing information for the recording medium is inputted,
- wherein the mask creation section sets the mask area based on the post-processing information.
An image forming method to form an image on a recording medium by adding a specific pattern, which is barely-noticeable, to image data inputted, comprising:
- inputting the image data;
- creating the specific pattern;
- creating a mask area in which addition of the specific pattern is prohibited so as to prevent the specific pattern from becoming noticeable at side edges of the recording media when the recording media are stacked;
- obtaining a synthesized data by synthesizing the specific pattern with the image data in an area other than the mask area;
- and
- forming an image on the recording medium based on the synthesized image data;
- wherein the post-processing information is inputted with the image data, and the mask area is created based on the post-processing information.
Dependencies are inferred from the claim text.