Semiconductor wafer inspection method

A semiconductor wafer inspection method for inspecting a chamfered surface of a semiconductor wafer including the chamfered surface formed on a main surface, a back surface, and a peripheral portion thereof, comprising:

• an imaging step in which a first image is taken using a first imaging device, the first image being an image of the chamfered surface seen from the main surface side and a second image is taken using a second imaging device, the second image being an image of the chamfered surface seen from the back surface side;
• a calculation step in which a first width is obtained based on the first image taken in the imaging step, the first width being a width of the chamfered surface seen from the main surface side, a second width is obtained based on the second image taken in the imaging step, the second width being a width of the chamfered surface seen from the back surface side, and a ratio of the first width to the second width thus obtained is calculated;
• and a shape determination step in which a form of the chamfered surface is determined to be abnormal in a case where the ratio calculated in the calculation step is out of a predetermined range.