System for monitoring foreign particles, process processing apparatus and method of electronic commerce
AssigneeHitachi High-Technologies Corporation
InventorsHidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
Life of this patent
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Abstract
A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.
Claims8
An inspection apparatus comprising:
- a plurality of inspection units for inspecting processed wafers of a plurality of processing apparatuses to generate inspection results, a respective inspection unit being arranged for inspecting wafers processed by a respective one of the plurality of processing apparatuses;
- a data analysis processing unit which compares inspection results generated by the plurality of inspection units with foreign matter distribution data which are failure analysis reference data, and which analyzes the result of the comparison to locate at least one probable dusting source among the plurality of processing apparatus;
- and
- a display unit coupled to the plurality of inspection units for the plurality of processing apparatuses;
- wherein the display unit displays the inspection results for at least two of the plurality of inspection units and the at least one located probable dusting source.
Dependencies are inferred from the claim text.