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US 8,045,134 B2Granted
Lithographic apparatus, control system and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsMarcus Adrianus Van De Kerkhof, Johannes Henricus Wilhelmus Jacobs, Tammo Uitterdijk, Nicolas Alban Lallemant
Life of this patent
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Abstract
An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
Claims24
A lithographic apparatus, comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to fill a space between the projection system and the substrate with a liquid;
- a measurement system configured to measure an effect associated with a temperature fluctuation of the liquid, the measurement system comprising an optical sensor configured to sense a radiation beam passing through liquid in the space at the same time that the patterned radiation beam is projected onto the substrate held on the substrate table, the sensor arranged so as to receive the radiation beam without the radiation beam having passed through the projection system or to receive the radiation beam from the projection system before or without the radiation beam re-entering the projection system;
- and
- a control system configured to determine, from the sensed beam, an effect associated with a temperature fluctuation of the liquid and to adjust the temperature of the liquid, the effect associated with the temperature fluctuation, or both.
3 more elements
A lithographic projection apparatus comprising:
- a substrate table constructed to hold a substrate;
- a projection system configured to project a patterned radiation beam onto a target portion of the substrate;
- a liquid supply system configured to fill a space between the projection system and the substrate with a liquid;
- a measurement system configured to measure an effect associated with a temperature fluctuation of the liquid, the measurement system comprising an optical sensor configured to sense a radiation beam passing through liquid in the space, the sensor arranged so as to receive the radiation beam without the radiation beam having passed through the projection system or to receive the radiation beam from the projection system before or without the radiation beam re-entering the projection system and configured to measure a focus of radiation passing through the liquid in the space;
- and
- a control system configured to move the optical sensor to a position under the projection system between exposures of the same substrate while the substrate is held on the substrate table and to determine, from the sensed beam and measured focus, an effect associated with a temperature fluctuation of the liquid and to adjust the temperature of the liquid, the effect associated with the temperature fluctuation, or both.
3 more elements
A device manufacturing method, comprising:
- projecting a patterned radiation beam, through a liquid, onto a substrate using a projection system;
- measuring an effect associated with a temperature fluctuation of the liquid, the measuring comprising sensing an optical characteristic of a radiation beam passing through liquid in the space, using a sensor, at the same time that the patterned radiation beam is projected onto the substrate held on the substrate table, the radiation beam sensed by the sensor not having passed through the projection system or the radiation beam sensed by the sensor coming from the projection system and sensed before or without the radiation beam re-entering the projection system;
- and
- controlling the temperature of the liquid, an effect associated with a temperature fluctuation of the liquid, or both, based at least on the sensed optical characteristic.
1 more element
A device manufacturing method, comprising:
- projecting a patterned radiation beam, through a liquid, onto a substrate using a projection system;
- measuring an effect associated with a temperature fluctuation of the liquid, the measuring comprising sensing an optical characteristic of a radiation beam passing through liquid in the space, using a sensor and measuring a focus of radiation passing through the liquid in the space, the radiation beam sensed by the sensor not having passed through the projection system or the radiation beam sensed by the sensor coming from the projection system and sensed before or without the radiation beam re-entering the projection system;
- moving the optical sensor to a position under the projection system between exposures of the same substrate while the substrate is held on the substrate table;
- and
- controlling the temperature of the liquid, an effect associated with a temperature fluctuation of the liquid, or both, based at least on the sensed optical characteristic and measured focus.
2 more elements
Dependencies are inferred from the claim text.