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US 8,044,764 B2Granted
Resistor and design structure having resistor material length with sub-lithographic width
AssigneeInternational Business Machines Corporation
InventorsMark C. Hakey, Stephen E. Luce, James S. Nakos
Life of this patent
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Abstract
A resistor and design structure including at least one resistor material length in a dielectric, each of the least one resistor material length having a sub-lithographic width are disclosed.
Claims8
A resistor comprising:
- a spacer having a sub-lithographic thickness;
- at least one resistor material length in a dielectric, each of the at last one resistor material length disposed beneath the spacer and having a sub-lithographic width substantially equal to the sub-lithographic thickness of the spacer;
- a first contact coupled to a first end of each resistor material length;
- and
- a second contact coupled to a second end of each resistor material length.
2 more elements
Dependencies are inferred from the claim text.