Semiconductor device having particular impurity density characteristics

A semiconductor device comprising:

• a substrate;
• a first semiconductor area formed on a major surface of said substrate with a certain thickness, said first semiconductor area being formed with a first bipolar transistor having a first emitter region, a first base region, a first collector region, and a first collector contact fixed to said first collector region, said first collector region including a first collector plug to which the first collector contact is fixed, a first buried region of a high impurity density expanding underneath the first collector plug and said first base region so as to allow the first bipolar transistor to operate under a high frequency;
• and
• a second semiconductor area formed on said major surface of said substrate with the same thickness as that of said first semiconductor area and electrically isolated from said first semiconductor area, said second semiconductor area being formed with a second bipolar transistor of the same conductivity type as that of said first bipolar transistor and having a second emitter region, a second base region, a second collector region, and a second collector contact fixed to said second collector region, said second collector region including a second collector plug to which the second collector contact is fixed, a high resistivity region expanding under, and contacting, the second base region, and a second buried region of a high impurity density formed underneath the second collector plug but not underneath the second base region so as to provide the second bipolar transistor with a high collector-emitter breakdown voltage;
• wherein said first and second emitter regions are formed with the same impurity density profile as that of the first conductivity type, said first and second base regions are formed with the same impurity density profile as that of the second conductivity type and with the same base depth, and said first and second collector plugs and said first and second buried regions in said first and second bipolar transistors are formed with the same impurity density profile as that of the first conductivity type, respectively,
• whereby the first and second bipolar transistors are operable under a high frequency and with a collector-emitter breakdown voltage, and are formed on the same substrate through the same and simultaneous manufacturing processes applied to said first and second semiconductor areas.

A semiconductor device comprising:

• a substrate provided with an insulating layer thereon, a first semiconductor area formed on said insulating layer with a certain thickness, and a second semiconductor area formed on said insulating layer with the same thickness as that of said first semiconductor area, said second semiconductor area being electrically isolated from said first semiconductor area;
• a first bipolar transistor formed in said first semiconductor area with a first emitter region, a first base region and a first collector region having a first buried region of a high impurity density buried underneath said first base region;
• and
• a second bipolar transistor formed in said second semiconductor area with a second emitter region, a second base region and a collector region, the second collector region having a region of a low impurity density, which expands from the bottom of the second base region to said insulating layer, and a second buried region of a high impurity density formed in a portion of the second collector region but not underneath said second base region;
• wherein said first and second emitter regions, said first and second base regions, and said first and second buried regions in said first and second bipolar transistors are formed through the same manufacturing processes applied to said first and second semiconductor areas, respectively,
• whereby the first and second bipolar transistors are operable under a high frequency and with a collector-emitter breakdown voltage, and are formed on the same substrate through the same and simultaneous manufacturing processes applied to said first and second semiconductor areas.

A semiconductor device comprising:

• a substrate;
• a plurality of semiconductor areas formed on a major surface of said substrate with the same thickness;
• electrical isolation means configured to electrically isolate said semiconductor areas from one another and from said substrate;
• a plurality of bipolar transistor configurations formed in said plurality of semiconductor areas, respectively, said plurality of bipolar transistor configurations being of the same conductivity type, in which each bipolar transistor is formed with a base region of a first conductivity type having the same impurity density profile and with the same base depth, an emitter region of the second conductivity type formed on the base region, a collector region of the second conductivity type underlying the base region within the same thickness of the semiconductor areas, at least one collector plug region of the second conductivity type, a collector contact electrically connected to the collector plug region, and a buried region having a high impurity density of the second conductivity type and formed with the same impurity density profile,
• wherein a first type of said bipolar transistor configurations is configured with the buried region expanding underneath the second base region and the collector plug region thereby to provide a bipolar transistor configuration of a high frequency operation, and
• wherein a second type of said bipolar transistor configurations is configured with the buried region formed underneath the collector plug region but not underneath the base region thereby to provide a bipolar transistor configuration of a high collector-emitter breakdown voltage.

A semiconductor device comprising:

• a substrate provided with an epitaxial layer of a semiconductor having a certain thickness with a low impurity density, said epitaxial layer having a first area and a second area electrically isolated from each other;
• a first bipolar transistor having a first emitter region, a first base region and a first collector region formed in said first area and a first collector contact fixed to said first collector region, said first collector region including a first buried region of a high impurity density expanding underneath the first collector contact and said first base region so as to allow the first bipolar transistor to operate under a high frequency;
• and
• a second bipolar transistor having a second emitter region, a second base region and a second collector region formed in said second area and a second collector contact fixed to said second collector region, said second collector region including a high resistivity region of the epitaxial layer expanding underneath the second base region and a second buried region formed underneath the second collector contact but not underneath the second base region, said second buried region having an impurity density profile which is substantially the same as that of the first buried region of said first bipolar transistor so as to provide the second bipolar transistor with a high collector-emitter breakdown voltage;
• wherein the first and second base regions, the first and second emitter regions, and the first and second buried regions for the first and second bipolar transistors are formed through the same manufacturing processes applied to the substrate, respectively,
• wherein each of the first and the second bipolar transistors is formed with a respective collector plug region to which its collector contact is fixed and which contacts its buried region, and
• wherein two of the collector plug regions are arranged in said second area so that the emitter region is located between the two collector plug regions in the second bipolar transistor,
• whereby the first and second bipolar transistors are operable under a high frequency and with a collector-emitter breakdown voltage, and are formed on the same substrate through the same and simultaneous manufacturing processes applied to the epitaxial layer.