Gas ion source with high mechanical stability
AssigneeICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
InventorsDieter Winkler, Thomas Jasinski
Life of this patent
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Abstract
A gas field ion source is described for a charged particle beam device having a charged particle beam column. The gas field ion source includes an emitter unit, a cooling unit, and a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit is adapted for reduction of vibration transfer from the cooling unit to the emitter unit.
Claims15
A gas field ion source for a charged particle beam device having a charged particle beam column, comprising:
- an emitter unit;
- a cooling unit;
- a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit includes a flexible wire, strip or braid extended between a protruding portion of the cooling unit and a protruding portion of the emitter unit and is adapted for reducing vibration transfer from the cooling unit to the emitter unit, the protruding portion of the cooling unit and the protruding portion of the emitter unit being overlapped in a first direction, and wherein the flexible wire, strip or braid of the thermal conductivity unit extends in a plane perpendicular to the first direction;
- and
- an emitter unit support for connecting the emitter unit with a portion of the charged particle beam column, wherein the emitter unit is indirectly connected to the cooling unit.
A charged particle beam device, comprising:
- a gas field ion source for a charged particle beam device having a charged particle beam column, the gas field ion source comprising:
- an emitter unit;
- and
- a cooling unit;
- a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit includes a flexible wire, strip or braid extended between a protruding portion of the cooling unit and a protruding portion of the emitter unit and is adapted for reducing vibration transfer from the cooling unit to the emitter unit, the protruding portion of the cooling unit and the protruding portion of the emitter unit being overlapped in a first direction, and wherein the flexible wire, strip or braid of the thermal conductivity unit extends in a plane perpendicular to the first direction;
- and
- an emitter unit support for connecting the emitter unit with a portion of the charged particle beam column, wherein the emitter unit is indirectly connected to the cooling unit.
A method of manufacturing a charged particle beam device comprising a gas field ion source for a charged particle beam device having a charged particle beam column, the gas field ion source having an emitter unit and a cooling unit, a thermal conductivity unit for thermal conductivity from the cooling unit to the emitter unit, wherein the thermal conductivity unit includes a flexible wire, strip or braid extended between a protruding portion of the cooling unit and a protruding portion of the emitter unit and is adapted for reducing vibration transfer from the cooling unit to the emitter unit, the protruding portion of the cooling unit and the protruding portion of the emitter unit being overlapped in a first direction, and wherein the flexible wire, strip or braid of the thermal conductivity unit extends in a plane perpendicular to the first direction, and an emitter unit support for connecting the emitter unit with a portion of the charged particle beam column, wherein the emitter unit is indirectly connected to the cooling unit, the method comprising:
- mounting the emitter unit and the cooling unit mechanically decoupled from each other to the charge particle beam column;
- and
- providing a mechanically decoupling thermal conductivity unit between the emitter unit and the cooling unit.
Dependencies are inferred from the claim text.