Ultraviolet absorber composition and resin composition
AssigneeFUJIFILM Corporation
InventorsIchiro Amasaki, Keizo Kimura
Life of this patent
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AssigneeFUJIFILM Corporation
InventorsIchiro Amasaki, Keizo Kimura
Estimating the term…
An ultraviolet absorber composition is provided and includes: a compound represented by formula (I); and an ultraviolet absorber having a maximum absorption at a wavelength of from 340 to 400 nm: R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j each independently represent a hydrogen atom or a monovalent substituent except OH, or adjacent two of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, and R1j may be taken together to form a ring; R1k, R1m, R1n, and R1p each independently represent a hydrogen atom or a monovalent substituent, or adjacent two of R1k, R1m, R1n, and R1p may be taken together to form a ring; and at least one of R1a, R1b, R1c, R1d, R1e, R1f, R1g, R1h, R1i, R1j, R1k, R1m, R1n, and R1p is a substituent having a positive σp value in Hammett equation.
An ultraviolet absorber composition comprising:
A resin composition comprising:
Dependencies are inferred from the claim text.