Method for providing electrical connections to spaced conductive lines
AssigneeMicron Technology, Inc.
InventorsGurtej Sandhu, Scott Sills
Life of this patent
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AssigneeMicron Technology, Inc.
InventorsGurtej Sandhu, Scott Sills
Estimating the term…
An integrated circuit and a method of formation provide a contact area formed at an angled end of at least one linearly extending conductive line. In an embodiment, conductive lines with contact landing pads are formed by patterning lines in a mask material, cutting at least one of the material lines to form an angle relative to the extending direction of the material lines, forming extensions from the angled end faces of the mask material, and patterning an underlying conductor by etching using said material lines and extension as a mask. In another embodiment, at least one conductive line is cut at an angle relative to the extending direction of the conductive line to produce an angled end face, and an electrical contact landing pad is formed in contact with the angled end face.
A method of fabricating an integrated circuit structure on a support structure, the method comprising:
A method of fabricating an integrated circuit structure on a support structure, the method comprising:
A method of fabricating an integrated circuit structure, the method comprising:
A method of fabricating an integrated circuit structure, the method comprising:
An integrated circuit comprising:
Dependencies are inferred from the claim text.